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REACTIVE ION-ETCHER
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Thermal evaporator system
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Thermal CVD SYSTEM
6inch
REACTIVE ION-ETCHER
Product and Service Overview
- Purpose : Etching
- Pump : Rotary vacuum pump
- Base pressure : ~10 -3 Torr
- Gas : Ar, O 2, H 2, CF 2
- Power : RF(13.56MHz, 600W)
- System control by touch panel
- Pressure control : Manual or automatic
For further assistance and customization of orders,
Please contact us at: GrapheneSquare(+82-2-880-6569)
Thermal evaporator system
Product and Service Overview
- Purpose : Organic & Metal deposition
- Pump : Turbo & Rotary pump
- Base pressure : ~10 -6 Torr
- Power : DC 1.5 kW
For further assistance and customization of orders,
Please contact us at: GrapheneSquare(+82-2-880-6569)
Thermal CVD SYSTEM - 6inch
Product and Service Overview
- Diameter of quartz tube: ~ 6 inch
- Process Gas: At customer's request
- Process Temperature: ~ 1,000 °C
- Uniformity of Film Thickness: ≤ +-3%
Reference
For further assistance and customization of orders,
Please contact us at: GrapheneSquare(+82-2-880-6569)
PRODUCT IMAGE
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Thermal CVD SYSTEM
4inch
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Vertical Thermal CVD SYSTEM
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Thermal CVD SYSTEM
8inch
Thermal CVD SYSTEM - 4inch
Product and Service Overview
- Diameter of quartz tube: ~ 4 inch
- Process Gas: At customer's request
- Process Temperature: ~ 1,000 °C on substrate
- Uniformity of Film Thickness: ≤ +-3%
For further assistance and customization of orders,
Please contact us at: GrapheneSquare(+82-2-880-6569)
PRODUCT IMAGE
Vertical Thermal CVD SYSTEM
PRODUCT IMAGE
Reference
For further assistance and customization of orders,
Please contact us at: GrapheneSquare(+82-2-880-6569)
Thermal CVD SYSTEM - 8inch
Product and Service Overview
- Diameter of quartz tube: ~ 8 inch
- Process Gas: At customer's request
- Process Temperature: ~ 1,000 °C on substrate
- Uniformity of Film Thickness: ≤ +-3%
For further assistance and customization of orders,
Please contact us at: GrapheneSquare(+82-2-880-6569)
PRODUCT IMAGE