We aspire to provide the best quality products
Features
Size (mm): 1500(W) x 893(H) x 590(D)
Economic & space-saving model.
Optimized for graphene, CNT, h-BN TMDC growth.
Water-cooled end chambers doors.
Process Temperature: ~1,100℃
Protective design from heat
Uniformity of Film Thickness: ≤+-3%
Testing Uniformity: ≤+-3%
Movable furnace method is our unique knowhow for fast heating fast cooling of the sample
2-Inch Table-Top Manual Type Thermal CVD
This small-size equipment has been developed on customers’ dem for the lower cost but higher quality synthesis of graphene 2D materials. TCVD-50B is the most ideal system for researchers who are limited in budget. The versatile specifications from fully manual to semi-automatic systems can be adjusted to fit the customers’ budget. We recommend this system for training or laboratory classes, the detailed instructing program materials will be provided upon purchase.
Furnace ( Heater )
TCVD Controller Panel
TCVD Vacuum/Gas Control
Rotary pump - W2V40 (*RP)
Pumping speed: 400 l/min
Pump oil: fomblin oil
Rotary pump auto vent valve
240 V AC (Normal open type)
Angle valve - NW 40
port, Pneumatic type
MFC (Atovac AFC500)
a. MFC1 : Ar (1000 SCCM )
b. MFC2 : CH4 (200 SCCM )
c. MFC3 : H2 (100 SCCM )
Pneumatic Valve
a. Ar input valve
b. CH4 input valve
c. H2 input valve
d. Vent valve
e. Main Gas input valve
Gas Module
Utility Area
Sample Loading End Chamber
Gas Supply End Chamber
Electric Power Panel
TCVD Error Alarm Singnal
TCVD Service Tool Box Components
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