We aspire to provide the best quality products
Features
Size (mm): 2300(W) x 1770(H) x 750(D)
Advanced Computer Controlled Automatic System
Optimized for graphene, CNT, h-BN TMDC growth
Water-cooled end chambers doors
Process Temperature: ~1,100 ºC
Uniformity of Film Thickness: ≤+-3%
Testing Uniformity: ≤+-3%
Movable furnace method is our unique knowhow for fast heating fast cooling of the sample.
Stard safety box
*Price will be determined after consultation. (Different customization from the stard parts will affect the overall price.)
4-Inch Automatic Dual-Furnace CVD System for TMDC Synthesis
TCVD-D100CA is an advanced equipment dedicated to the growth of TMDC materials such as MoS2, WSe2, etc. The computer-aided controlling module promises the reliable growth condition for multiple users. The movable dual furnace system enables the fast heating fast cooling of source materials substrates, which is important for the synthesis of higher quality TMDCs. The safety housing with emergency alarm/stop functions will ensure the safe operation by users.
Furnace ( Heater )
TCVD Controller Panel
TCVD Vacuum/Gas Control
Rotary pump - W2V40 (*RP)
Pumping speed: 400 l/min
Pump oil: fomblin oil
Rotary pump auto vent valve
240 V AC (Normal open type)
Angle valve - NW 40
port, Pneumatic type
MFC (Atovac AFC500)
a. MFC1 : Ar (1000 SCCM )
b. MFC2 : CH4 (200 SCCM )
c. MFC3 : H2 (100 SCCM )
Pneumatic Valve
a. Ar input valve
b. CH4 input valve
c. H2 input valve
d. Vent valve
e. Main Gas input valve
Gas Module
Utility Area
Sample Loading End Chamber
Gas Supply End Chamber
Electric Power Panel
TCVD Error Alarm Singnal
TCVD Service Tool Box Components